Business
AP Systems, moving forward into the world with a passion for endless research and technological developments
Display(Front-End Process)
Excimer Laser Annealing
KORONA™ LTP
It is a laser thermal process system designed for Low Temperature Poly Silicon Crystallization (LTPS). We have integrated world-class laser, optics technology, and chamber technology to form high quality LTPS TFT (Thin Film Transistor). It is applied in AMOLED backplane and LTPS LCD fields.
Technology
Irradiate Excimer Laser on the TFT board with a-Si film to form Poly-Si film.
Specification
| Laser Type | Excimer Laser |
|---|---|
| Laser Wavelength | 308nm (XeCl) |
| Laser Repetition Rate | 600Hz |
| Laser Pulse Energy | 1J, 2J, 4J |
| Laser Uniformity | Long Axis (2σ): ≤ 1.8% (@96%) Short axis (2σ): ≤ 3.0% (@96%) |
| Stage Type | Single Plane or Stack Plane |
| Stage Position accuracy | X axis: <±2um Y axis: <±2um |
| Process Environment | ATM & N2 Atmosphere |
| Software | Easy Cluster™ |
| Safety Certification | CE, SEMI, S-Mark |
